PURPOSE: To enable the formation of a film uniform both in the thickness and quality thereof on the surface of a substrate by arranging at least a pair of magnets while making the same poles are arranged to each other so as to hold a sheet-shaped plasma therebetween.
CONSTITUTION: Plural pairs of permanent magnets 7a, 7b to 10a, 10b are provided while making the same poles face each other so as to hold the sheet- shaped plasma P formed by the permanent magnet 5a, 5b threbeetween. After the plasma generated from a plasma gun 2 is formed in the sheet-shape by the permanent magnets 5a, 5b, the thickness thereof is increased as the influence of the magnetic field of the permanent magnets 5a, 5b is decreased. However, the thickness of the plasma is made thinner again by the permanent magnets 7a, 7a. Thereafter, the thickness of the plasma is made thinner by the next permanent magnets 8a, 8b, although the thickness of the plasma is increased again. Thereafter, the plasma reaches an anode 3 by repeating the increase and decrease in the thickness thereof. A gaseous raw material and a reaction gas supplied from a nozzle 6 are activated in the sheet-shaped plasma P, thus the film having uniform thickness and quality is formed on the substrate W.
| JP3375646 | [Title of Invention] Plasma processing apparatus |
| JPH07111261 | APPARATUS AND METHOD FOR FILM FORMING |
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KAMIIDE MASAO
SHINTANI MASANORI
MATSUSHIMA KATSUMI
