To provide a clean vessel superior in shock resistance by adopting achievements in conventional local cleaning technology.
The shock resistant clean vessel 1 has a vessel 3 and, a door 17 is installed in the vessel 3 through a gasket 18. Buffer materials 21c and 21d are arranged on the door 17. Buffer materials 21a and 21b are disposed on an inner wall at the upper part 13 of the vessel 3. Lower holders 24a and 24b are disposed on upper faces of the buffer materials 21c and 21d. Upper holders 23a and 23b are arranged on lower faces of the buffer materials 21a and 21b. In a state where the door 17 is closed, a sample 25 is sandwiched with the upper holders 23a and 23b and the lower holders 24a and 24b. The buffer materials installed in the upper holders and the lower holders prevent a shock from outside from being transmitted to the sample 25.
SANO NAOTAKE
ARITSUKA YUKI
| JP2003258079A | 2003-09-12 | |||
| JPS63208414A | 1988-08-29 | |||
| JPH0221741A | 1990-01-24 | |||
| JP2004214658A | 2004-07-29 | |||
| JP2001298078A | 2001-10-26 | |||
| JP2005289432A | 2005-10-20 |
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