Title:
シャッター装置及びその制御方法、リソグラフィー装置及びその露光量制御方法
Document Type and Number:
Japanese Patent JP6909858
Kind Code:
B2
Abstract:
Disclosed herein are a shutter device, a method of controlling the shutter device, a photolithography machine and a method of controlling an exposure dose thereof. The shutter device includes a light blocking unit and a voice coil motor (100). The voice coil motor (100) includes a permanent magnet module (110), a guide track assembly (120) and a coil assembly (130). The coil assembly (130) is arranged on the guide track assembly (120), and the permanent magnet module (110) is adapted to produce a magnetic field in the guide track assembly (120). The light blocking unit includes two shutter blades (200) both connecting to the coil assembly (130). When energized, the coil assembly (130) will produce a magnetic field having a direction same as or opposite to the direction of the magnetic field in the guide track assembly (120) so that the coil assembly (130) moves forward or backward along the guide track assembly (120) to drive the two shutter blades (200) to open or close. By directly connecting the coil assembly (130) in the voice coil motor (100) to the light blocking unit, an exposure duty cycle of the shutter blades (200) can be significantly shortened, thus increasing yield under low-dose exposure conditions as well as light-source energy utilization per unit time.
Inventors:
Jiang Zhi
Shohei
Ohiko Fei
Shohei
Ohiko Fei
Application Number:
JP2019539864A
Publication Date:
July 28, 2021
Filing Date:
January 25, 2018
Export Citation:
Assignee:
Shanghai Micro Electronics Equipment (Group) Company Limited
International Classes:
G03B9/08; G03F7/20
Domestic Patent References:
| JP2007292951A | ||||
| JP5150288A | ||||
| JP50050919A |
Foreign References:
| US4839679 | ||||
| US5706120 | ||||
| CN102087476A |
Attorney, Agent or Firm:
Hiroshi Oue