Title:
SiOx:Si複合物体およびその製造方法
Document Type and Number:
Japanese Patent JP2009504557
Kind Code:
A
Abstract:
Article are made from silicon oxide and electrically conductive doped silicon materials that are joined in a protective environment to yield a composite SiOx:Si material that exhibits the properties of SiOx and yet is electrically conductive due to the presence of the Si. Articles from such composite materials find many uses, such as for targets for DC and/or AC sputtering processes to produce silicon oxide thin films for touch-screen application, barrier thin films in LCD displays and optical thin films used in a wide variety of applications.
Inventors:
Stevenson, David Yee
Shu, Lee Kew
Shu, Lee Kew
Application Number:
JP2008526303A
Publication Date:
February 05, 2009
Filing Date:
August 11, 2006
Export Citation:
Assignee:
WINTEK ELECTRO-OPTICS CORPORATION
International Classes:
C01B33/00; H01B1/14
Attorney, Agent or Firm:
Kuro Fukami
Toshio Morita
Yoshihei Nakamura
Yutaka Horii
Hisato Noda
Masayuki Sakai
Nobuo Arakawa
Toshio Morita
Yoshihei Nakamura
Yutaka Horii
Hisato Noda
Masayuki Sakai
Nobuo Arakawa