To obtain a new polysiloxane that is suitable as a resin component in chemically amplified resist particularly having excellent I-D bias and depth of focus (DOF), a new silane compound useful as a raw material for producing the polysiloxane, and a polysiloxane-containing radiation ray-sensitive resin composition.
The silane compound is represented by formula (I). The polysiloxane has a structural unit represented by formula (1) or has the unit (1) and a structural unit represented by formula (2) (wherein R is an alkyl, R1 and R2 are each fluorine atom, or a lower alkyl or a lower fluorinated alkyl, (n) and (m) are each 0 or 1, (k) is 1 or 2, (i) is an integer of 0 to 10). The radiation ray-sensitive resin composition contains the polysiloxane and a radiation ray sensitive acid-generating agent.
YAMAHARA NOBORU
TANAKA MASATO
SHIMOKAWA TSUTOMU
