Title:
SILICA PRECURSOR/ORGANIC POLYMER COMPOSITION
Document Type and Number:
Japanese Patent JP2001115021
Kind Code:
A
Abstract:
To provide a silica precursor/organic polymer composition for the production of a porous silica having low hygroscopicity and high mechanical strength.
A porous silica thin film is produced by removing an organic polymer from a thin film of a silica/organic polymer composite material obtained by using a composition composed of a silica precursor and an organic polymer by controlling the molar ratio of a tetrafunctional alkoxysilane to a trifunctional alkoxysilane within a specific range.
Inventors:
TAMURA NOBUSHI
HANABATAKE HIROYUKI
HANABATAKE HIROYUKI
Application Number:
JP29543599A
Publication Date:
April 24, 2001
Filing Date:
October 18, 1999
Export Citation:
Assignee:
ASAHI KASEI CORP
International Classes:
H01L21/768; C01B33/12; C08G77/02; C08G77/04; C08J5/18; C08J9/26; C08K3/24; C08K5/09; C08K5/5415; C08L67/00; C08L69/00; C08L71/02; C08L73/00; C08L83/02; C08L83/04; H01L21/31; H01L21/312; H01L21/316; H01L23/522; (IPC1-7): C08L83/02; C08J5/18; C08J9/26; C08K3/24; C08K5/09; C08L67/00; C08L71/02; C08L73/00; C08L83/04; H01L21/31