SILICACEOUS FILM FORMING COMPOSITION, SILICACEOUS FILM, METHOD FOR PRODUCING THE SAME, AND ELECTRONIC COMPONENT

Japanese Patent JP2008050610

A

To provide a silicaceous film forming composition capable of forming a silicaceous film having low permittivity, excellent bondability, and sufficient mechanical strengths.

The silicaceous film forming composition comprises a component (a): a siloxane resin prepared by hydrolytically condensing a compound represented by formula (1); R1nSiX4-n (wherein R1 is H, F, a group containing B, N, Al, P, Si, Ge, or Ti, or a 1-20C organic group; and X is a hydrolyzable group; and n is an integer of 0-2, provided that R1s may be the same or different from each other when n is 2; and Xs may be the same or different from each other when n is 0-2), a component (b): a solvent which can dissolve component (a), and a component (e): a polymer having hydroxyl-containing side chains, wherein the polymer satisfies the relationship represented by formula (2); 0MOH0.410-2 (wherein MOH is the concentration (mol/g) of the hydroxyl groups of the polymer).

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SAKURAI HARUAKI
ABE KOICHI
ENOMOTO KAZUHIRO
NOBE SHIGERU

JP2007234334A

March 06, 2008

September 10, 2007

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HITACHI CHEMICAL CO LTD

C09D183/00; B05D7/24; C01B33/12; C09D7/00; C09D133/02; C09D201/06; H01L21/312; H01L21/316

Yoshiki Hasegawa
Shiro Terasaki
Yoshinori Shimizu

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