SILICON-CONTAINING COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME

Title:

SILICON-CONTAINING COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME

Document Type and Number:

Japanese Patent JP2002308945

Kind Code:

A

Abstract:

To obtain a novel silicon-containing copolymer useful for a photosensitive resin composition which is used for the upper layer of a double-layer resist system and has excellent tack to the lower layer of a resin.

The silicon-containing copolymer comprises a repeating unit of maleic anhydride, a repeating unit of norbornene, and a repeating unit of at least one silicon-containing norbornene. The silicon-containing copolymer is suited in use as the upper layer resist of a double-layer resist system.

Inventors:

SO SEITAN
KAN SOSHIN
SHO ITO
SO SHISHIN
TEI KANHIN
CHO ZUIHATSU
RIN SHIGYOKU

Application Number:

JP2001375757A

Publication Date:

October 23, 2002

Filing Date:

December 10, 2001

Export Citation:

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Assignee:

IND TECH RES INST

International Classes:

C08F222/06; C08K5/36; C08L35/00; G03F7/004; G03F7/039; G03F7/075; H01L21/027; (IPC1-7): C08F222/06; C08K5/36; C08L35/00; G03F7/039; G03F7/075; H01L21/027

Attorney, Agent or Firm:

Sota Asahina (3 outside)

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