To provide a needle having a high degree of design freedom, a high bending strength, and an extremely high aspect ratio.
A method of manufacturing a silicon nano-needle includes: a step of forming a lead protection film R1, which is a film for protecting a continuous region having a minimum width of 1 μm or more, in one or more areas of a principal surface 101 of a silicon substrate 100; a step of forming a straight cylindrical body 102 by etching a region exposed from the lead protection film R1 on the principle surface 101 of the silicon substrate 100 in a vertical direction; a step of thermally oxidizing the silicon substrate 100 until the maximum cross-sectional width of a right cylindrical body region 104 remaining unoxidized in the right cylindrical body 102 becomes less than 1 μm; and a step of forming a needle 10 made of silicon and having a lead, which is composed of the right cylindrical body region 104, and a mount 105, which has a side surface composed of a flare surface spreading toward the bottom and from the top of which the lead 104 protrudes, by removing an oxidized film 103 formed on the silicon substrate 100.
MAENAKA KAZUSUKE
HYOGO PREFECTURE
JAPAN SCIENCE & TECH AGENCY
| JPH05226317A | 1993-09-03 | |||
| JP2004538106A | 2004-12-24 | |||
| JP2009254814A | 2009-11-05 | |||
| JP2008143068A | 2008-06-26 | |||
| JPH11304824A | 1999-11-05 |
Dai Yoshida
Wataru Iwakami
Dai Yoshida
Wataru Iwakami