Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SILICON SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, ITS MANUFACTURING METHOD, MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING DEVICE
Document Type and Number:
Japanese Patent JP2006082219
Kind Code:
A
Abstract:

To provide a silicon substrate for a magnetic recording medium and its manufacturing method capable of improving dimensional accuracy of a circular hole at the center of a substrate and preventing occurrence of flaw due to friction with a spindle, and provide a magnetic recording medium using the silicon substrate and a magnetic recording device.

A lot of silicon substrates are finished so that the dimensional accuracy (maximum value - minimum value) of the inside diameter of the circular hole of the center is within 4 μm. As for the manufacturing method, a lot of pieces of silicon substrate laminated bodies are prepared, a brush polishing is performed after the circular hole of the center is ground, and the silicon substrate laminated bodies are reversed ups and downs in the middle of the brush polishing process. A magnetic layer is formed on a main surface of the silicon substrate obtained thereby, made to be the magnetic recording medium, and a magnetic recording device incorporating the magnetic recording medium.


Inventors:
AIDA KATSUAKI
Application Number:
JP2005232910A
Publication Date:
March 30, 2006
Filing Date:
August 11, 2005
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SHOWA DENKO KK
International Classes:
B24B29/04; B24B29/00; G11B5/73; G11B5/82; G11B5/84
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama



 
Previous Patent: SURFACE-COATING CUTTING TOOL

Next Patent: POWER TOOL