Title:
良好な溶解性と安定性を有するシリコーン樹脂組成物
Document Type and Number:
Japanese Patent JP5133475
Kind Code:
B2
Abstract:
PURPOSE: Provided are a silicone resin having good solubility and stability and used in forming nanoporous film, and a production method thereof. CONSTITUTION: A nanoporous silicone resin is a reaction product obtained by reacting a mixture containing (A) 15-70 mol.% of a tetraalkoxysilane of the formula: Si(OR1)4, (B) 12-60 mol.% of a hydrosilane of the formula: SiX3 and (C) 15-70 mol.% of an organic trialkoxysilane of the formula: R2Si(OR3)3, in the presence of (D) water, (E) a hydrolysis catalyst and (F) an organic solvent for the reaction product. In the formulae, each R1 is independently selected form C1-C6 alkyl groups; each X is independently selected from hydrolyzable substituents; R2 is C8-C24 hydrocarbon group or substituted hydrocarbon group including C8-C24 hydrocarbon chain; and each R3 is independently selected from C1-C6 alkyl groups.
Inventors:
Bian Xiao Jung
Russell Keith King
Kuha Chun
Sejong Jean
Russell Keith King
Kuha Chun
Sejong Jean
Application Number:
JP2000325050A
Publication Date:
January 30, 2013
Filing Date:
October 25, 2000
Export Citation:
Assignee:
DOW CORNING CORPORATION
International Classes:
C08G77/12; C08G77/16; C01B33/12; C08G77/00; C08G77/06; C09D183/05; H01L21/312; H01L21/316; H01L21/768; H01L23/522; H01L23/532
Domestic Patent References:
| JP2001335746A | ||||
| JP2001335748A | ||||
| JP2001055509A | ||||
| JP7097548A | ||||
| JP2003508895A | ||||
| JP10287746A | ||||
| JP9315812A | ||||
| JP2001240673A |
Foreign References:
| WO1998047942A1 | ||||
| WO1998047941A1 | ||||
| WO1998047944A1 | ||||
| WO1998047945A1 | ||||
| WO1995018190A1 | ||||
| WO2003011945A2 | ||||
| WO2000018847A1 |
Attorney, Agent or Firm:
Michiharu Soga
Yutaka Ikeya
Hidetoshi Furukawa
Suzuki Kenchi
Koji Fukui
Keiro Mochizuki
Yutaka Ikeya
Hidetoshi Furukawa
Suzuki Kenchi
Koji Fukui
Keiro Mochizuki