Title:
SILOXANE COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2007210996
Kind Code:
A
Abstract:
To provide a means for reducing the pattern roughness of a photoresist composition and improving etching resistance.
The siloxane compound is obtained by a reaction between a compound represented by chemical formula (2) and a compound having a steroid backbone. The photoresist composition comprises the compound. The pattern formation method comprises using the composition.
COPYRIGHT: (C)2007,JPO&INPIT
Inventors:
YUN HYO JIN
KIM JAE HO
KIM YOUNG-HO
KIM BOO-DEUK
KIM DO YOUNG
KIM JAE HO
KIM YOUNG-HO
KIM BOO-DEUK
KIM DO YOUNG
Application Number:
JP2006341802A
Publication Date:
August 23, 2007
Filing Date:
December 19, 2006
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
C07F7/21; C07J9/00; G03F7/039; G03F7/075; H01L21/027
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Katsuyuki Utani
Ken Fujita
Masanori
Toshihiro Hasegawa
Yasuo Nara
Katsuyuki Utani
Ken Fujita
Masanori
Toshihiro Hasegawa