PURPOSE: To lessen the generation of rubbing flaws and blackening in spite of ultra-rapid processing by incorporating colloidal silica into the emulsion layer furthest from a base and incorporating substantially no colloidal silica into the other emulsion layers.

CONSTITUTION: This photosensitive material contains ≥2 layers of the photosensitive silver halide emulsion layers on at least one side of the base. The colloidal silica is incorporated into the emulsion layer (uppermost emulsion layer) furthest from the base and substantially no colloidal silica is incorporated into the other emulsion layers. The average grain size of this colloid-like silica (colloidal silica) is 5 to 1000mμ, more preferably 5 to 500mμ and its essential component is silicon dioxide and may contain alumina or sodium aluminate as a small-amt. component. A silver bromide, silver iodobromide, silver chloride, silver chlorobromide, silver chloroiodobromide are used as the photosensitive silver halide particles.