PURPOSE: To obtain the photosensitive material high in sensitivity and small in residual dye stains after processing by incorporating a specified compound.
CONSTITUTION: The photosensitive material contains the compound represented by the formula in which each of R1 and R2 is an alkyl group having a group for giving water-solubility to this compound in the form of a free acid or salt; each of V1-V4 is H or a univalent substituent and each does not combine with each other to form a ring and the sum of each molecular weight of 4-50; each of L1-L4 is an optionally substituted methine group; and m. is an integer of 0-4 neutralizing an intramolecular charge. The photosensitive material is exposed to laser beams emitted by ≥2 laser sources, preferably, He-Ne laser or a semiconductor laser source, having a wavelength region of 670nm±10nm.
OYA TOYOHISA
YAMAMOTO SEIICHI
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