SIMULATED GAS SUPPLY DEVICE

Japanese Patent JP2013104694

A

To change a flow rate of a simulated gas to be supplied to a test object while suppressing a temperature variation of the simulated gas to be supplied to the test object.

A simulated gas supply device includes: a first gas supply path 2; a first gas heating part 4 that is connected with the first gas supply path 2 and heats the first gas supplied through the first gas supply path 2; a simulated gas supply path 6 that supplies the test object with the simulated gas generated by heating by the first gas heating part 4; and a simulated gas discharge path 7 that discharges the simulated gas outside, without supplying the test object with the simulated gas generated by heating by the first gas heating part 4. The simulated gas supply device controls a discharge flow rate of the simulated gas through the simulated gas discharge path 7, to adjust a supply flow rate of the simulated gas supplied from the simulated gas supply path 6 to the test object.

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OKADA YOICHI

JP2011246867A

May 30, 2013

November 10, 2011

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HORIBA LTD

G01M15/10; F01N3/00; F01N3/24; G01N1/00; B01D53/94

JPH10319006A	1998-12-04
JP2004195367A	2004-07-15
JP2005016472A	2005-01-20
JP2009219948A	2009-10-01
JP2005523396A	2005-08-04
JP2003126658A	2003-05-07
JP2002116116A	2002-04-19

Ryuhei Nishimura
Akiko Sato
Saito Shindai

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