Title:
SIMULATION METHOD, SIMULATOR, AND RECORDING MEDIUM RECORDING SIMULATION PROGRAM
Document Type and Number:
Japanese Patent JP2001297955
Kind Code:
A
Abstract:
To provide a simulation method that can separately handle silicide reaction in first- and second-stage heat treatment.
A silicide process is handled based on composition change in a silicide film that is being heat-treated, and the silicide reaction in the first- and second-stage heat treatment is simulated separately.
Inventors:
KUSUNOKI NAOKI
Application Number:
JP2000112928A
Publication Date:
October 26, 2001
Filing Date:
April 14, 2000
Export Citation:
Assignee:
TOSHIBA CORP
International Classes:
H01L21/00; G06F17/50; (IPC1-7): H01L21/00
Attorney, Agent or Firm:
Togawa Hideaki