Title:
SIMULATION METHOD
Document Type and Number:
Japanese Patent JP2950253
Kind Code:
B
Abstract:
PROBLEM TO BE SOLVED: To greatly reduce random error by calculating the release angle distribution of supper particles, performing the orbital calculation of an MC method with practical precision and time, and obtaining a maturation figure.
SOLUTION: The release angle distribution of particle from a target is calculated by using a molecular dynamics method (S1). The vertical component of the distribute is calculated in the angle region of equal interval, and the intensity function of the distribution is calculated by an interpolation method (S2). The vertical component is determined with the intensity function by using a critical method (S3). The horizontal component is determined with equal probability all directions by using random numbers (S4). The vertical component and the horizontal component are used, and the orbit of sputter particles in an equipment calculated by using a Monte Carlo method (S5). From the orbit, the film formation figure of a wafer is obtained by using a string model or the like. Thereby a generation of random error is reduce, and an ideal film formation figure can be realized.
Inventors:
Yamada, Hiroaki
Application Number:
JP1996000277752
Publication Date:
July 09, 1999
Filing Date:
October 21, 1996
Export Citation:
Assignee:
NEC CORP
International Classes:
C23C14/34; G06F17/50; G06F19/00; G06Q50/00; H01L21/00; H01L21/203; C23C14/34; G06F17/50; G06F19/00; G06Q50/00; H01L21/00; H01L21/02; (IPC1-7): H01L21/203; C23C14/34; G06F17/00
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