Title:
SINGLE SEMICONDUCTOR SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JPH01194326
Kind Code:
A
Abstract:
PURPOSE:To make single semiconductor substrates in a clean room flow fluently and improve the total efficiency by a method wherein a holder which can rotate and dry the semiconductor substrate also serves as a liquid bath. CONSTITUTION:A sheet of a semiconductor substrate 18 is held by a chuck holder mechanism 1. The treatment process of the substrate 18 such as etching and washing is performed while a drain duct 4 and an exhaust chamber 3 are provided. Then an O-ring 25 is removed by the operation of a second cylinder 22 and a second guide 23 to discharge treatment solution. Then, after the O-ring 25 is released to separate the exhaust chamber 3 from the mechanism 1 by the operation of a cylinder 15 and a guide 16, a spinning mechanism 2 is rotated with a high speed to remove moisture from the single substrate 18 for drying. Then the single substrate 18 is taken out to complete the whole process.
Inventors:
NIBARI IKUO
Application Number:
JP1711488A
Publication Date:
August 04, 1989
Filing Date:
January 29, 1988
Export Citation:
Assignee:
TOSHIBA CORP
International Classes:
H01L21/304; H01L21/306; (IPC1-7): H01L21/304; H01L21/306
Attorney, Agent or Firm:
Norio Ogo (1 outside)