To provide a sintered body and a sputtering target consisting of Ag containing FePtC-based low-melting-point material having a high density, low oxygen content and a uniform microstructure.

The sintered body containing Fe, Pt, C and Ag comprises having; a chemical composition expressed by a formula (Fe_x/100Pt_(100-x)/100)_100-y-zAg_yC_z, in which 35≤x≤65, 1≤y≤20 and 13≤z≤60; a relative density of 95% or more; an oxygen content of 700 ppm or less; and a major axis length of a phase consisting of Ag of 20 μm or less. Since a sputtering target consisting of the sintered body has a high density, low oxygen content and a uniform microstructure, the sputtering target is excellent in terms of film properties and capable of forming a high-performance thin film such as a magnetic recording film.