Title:
焼結非多孔質カソードおよびこれを含むスパッタイオン真空ポンプ
Document Type and Number:
Japanese Patent JP7010830
Kind Code:
B2
Abstract:
The present invention relates to cathodes electrodes compositions suitable to provide a pumping mechanism which exhibits an extremely high pumping speed and capacity of noble gas suitable to be used in several vacuum devices as for example sputter ion vacuum pumping systems comprising them as active element.
More Like This:
| JPH0568067 | [Name of device] Spatter ion pump |
| WO/2023/177745 | COMPACT VACUUM PACKAGING TECHNOLOGY USABLE WITH ION TRAPS |
Inventors:
Tommaso Porcelli
Fabrizio Civiero
Alessandro Garitotonta
Fabrizio Civiero
Alessandro Garitotonta
Application Number:
JP2018537638A
Publication Date:
January 26, 2022
Filing Date:
February 15, 2017
Export Citation:
Assignee:
SAES Getters Esse Pi A
International Classes:
H01J41/20; C22C1/04; C22C14/00; C22C16/00; C22C27/02; F04B37/02
Domestic Patent References:
| JP56041342A | ||||
| JP41002267B1 |
Foreign References:
| US4097195 | ||||
| US3684401 | ||||
| US3542488 | ||||
| GB1171141A |
Attorney, Agent or Firm:
Murayama Yasuhiko
Shinya Mihiro
Tatsuhiko Abe
Shinya Mihiro
Tatsuhiko Abe