Title:
SKIN CARE PREPARATION FOR AMELIORATING AND PREVENTING NONALLERGIC CHAPPED SKIN AND SKIN CARE PREPARATION FOR AMELIORATING AND PREVENTING PIMPLE
Document Type and Number:
Japanese Patent JP2002212045
Kind Code:
A
Abstract:
To obtain a skin care preparation for ameliorating and preventing nonallergic chapped skin and an agent for ameliorating and preventing nonallergic chapped skin, having ameliorating and preventing effect on nonallergic chapped skin and rough skin caused by drying, a detergent, etc., and an agent for ameliorating and preventing pimple and a skin care preparation for ameliorating and preventing pimple, promoting recovery of pimple and having ameliorating and preventing effect on pimple and rash.
This skin care preparation comprises ethylenediaminedisuccinic acid or its salt.
Inventors:
KATSUTA YUJI
NANBA TOMIYUKI
NANBA TOMIYUKI
Application Number:
JP2001008816A
Publication Date:
July 31, 2002
Filing Date:
January 17, 2001
Export Citation:
Assignee:
SHISEIDO CO LTD
International Classes:
A61K8/00; A61K8/30; A61K8/41; A61K31/197; A61P17/10; A61P17/16; A61Q19/00; (IPC1-7): A61K7/48; A61K7/00; A61K31/197; A61P17/10; A61P17/16
Attorney, Agent or Firm:
Chieko Tateno