To provide a skin and hair cosmetic having excellent moisture retention and hair dressing activity, composed mainly of natural ingredients, and containing practically no chemically synthesized ingredient which is compounded in conventional skin and hair cosmetics as an active ingredient, causes chapped skin and allergy on the skin and scalp, disturbs hair growth and hair fostering, and causes skin and scalp stimulation and hair fall, and to provide a method for producing the cosmetic.
A hair and skin cosmetic having moisture retention and hair dressing activity and containing, as active ingredients, extracts extracted from microorganism with an alcohol aqueous solution, is provided, wherein the microorganism is one or more selected from microorganisms belonging to genuses Aureobacidium, Bacillus, Saccharomyces, Zygosaccharomyces, Schizosaccharomyces, Pichia, Hansenula, Kluyveromyces, Bullera, Kloeckera, Rhodotorula and Sporobolomyces, and a method for producing the cosmetic is also provided.
FUKUDA SHIGEHARU
MIYAKE TOSHIO
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