Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
汚泥の脱水乾燥装置
Document Type and Number:
Japanese Patent JP5190474
Kind Code:
B2
Abstract:

To provide a dehydration and drying apparatus for sludge provided with a fixing structure for a film and/or a filter cloth which gives practically required using frequencies and is inexpensive.

The dehydration and drying apparatus 1 for sludge, which forms a low moisture content dried cake by feeding a warm fluid to sludge and dehydrating and drying it, at least includes: a pair of filter plates 4 including core plates 26, the filter cloth 34 installed on both surfaces of the core plates to form a filter chamber 32, and a film 38 installed on the back side of at least one of the filter cloth to form a fluid chamber for the warm fluid; and fixing means 72, 104 for fixing the respective ends of the film and/or the filter cloth along the nearly whole outer periphery of the core plate.

COPYRIGHT: (C)2010,JPO&INPIT


Inventors:
Tsutomu Tanaka
Masaaki Fukushima
Tameno Koshino
Yutaka Murata
Application Number:
JP2010027465A
Publication Date:
April 24, 2013
Filing Date:
February 10, 2010
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Actry Co., Ltd.
International Classes:
C02F11/12; B01D25/12
Domestic Patent References:
JP2001232109A
JP3054709U
JP3109907A
JP64038113A
JP2002037685A
JP2000334221A
JP11319419A
JP2004202411A
JP2001259311A
JP60119905U
JP9276616A
JP48022268U
JP9108509A
JP11137916A
JP11319422A
JP61111509U
JP5026110U
JP6091110A
JP63149205U
JP9313811A
JP10033908A
JP2003135908A
JP46014714Y1
JP48022267U
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Disciple Maru Ken
Ino Sato



 
Previous Patent: JPS5190473

Next Patent: GROWTH APPARATUS OF SILICON OXIDE FILM