Title:
有機高分子眼科基材のスラリー組成物及び研磨方法
Document Type and Number:
Japanese Patent JP5193852
Kind Code:
B2
Abstract:
The present invention provides a slurry composition and method for polishing organic polymer-based ophthalmic substrates. The slurry composition according to the invention includes an aqueous dispersion of abrasive particles and a pyrrolidone compound. The abrasive particles can be alumina, zirconia, silica, titania or combinations of the foregoing. Slurry compositions according to the invention can be used to polish all types of organic polymer-based ophthalmic substrates, but are particularly useful for polishing organic polymer-based ophthalmic substrates having an index of refraction greater than 1.498 because they remove such materials at a greater efficiency than conventional slurry compositions without detrimentally affecting the quality of the resulting surface.
Inventors:
Ferranti Stephen, A.
Application Number:
JP2008505303A
Publication Date:
May 08, 2013
Filing Date:
February 22, 2006
Export Citation:
Assignee:
KIM,Steve,S.
International Classes:
B24B37/00; B24B13/00; G02C7/02; G02C13/00
Domestic Patent References:
| JP54101590A | ||||
| JP2005074550A | ||||
| JP2004082324A | ||||
| JP8099268A | ||||
| JP62043482A | ||||
| JP63169262A | ||||
| JP2002305198A | ||||
| JP2004311967A | ||||
| JP2000256654A |
Attorney, Agent or Firm:
Yuji Iwahashi