Title:
SOLID IMMERSION LENS UNIT AND SEMICONDUCTOR INSPECTION DEVICE
Document Type and Number:
Japanese Patent JP2020020994
Kind Code:
A
Abstract:
To provide a solid immersion lens unit which can realize a high-resolution and vivid observation, and a semiconductor inspection device having the solid immersion lens unit.SOLUTION: A solid immersion lens unit 1 includes: a solid immersion lens 2 having a contact surface 2a for getting in contact with a semiconductor device S made of a silicon substrate and a sphere 2b facing an objective lens 150, the lens transmitting lights with wavelengths in the range from 200 nm to 1100 nm, both inclusive; a holder 3 holding the solid immersion lens 2; and an optical element 4 held by the holder 3 to be located between the objective lens 150 and the solid immersion lens 2, the optical element correcting the aberration resulting from the difference in the refractive index between the silicon substrate and the solid immersion lens 2.SELECTED DRAWING: Figure 3
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Inventors:
MAO XIANG GUANG
KOBAYASHI MASANORI
TERADA HIROTOSHI
ARATA IKUO
IKESU MASATAKA
KOBAYASHI MASANORI
TERADA HIROTOSHI
ARATA IKUO
IKESU MASATAKA
Application Number:
JP2018145977A
Publication Date:
February 06, 2020
Filing Date:
August 02, 2018
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK
International Classes:
G02B21/36; G02B7/02; G02B7/04; G02B7/14; H01L21/66
Domestic Patent References:
| JP2006227565A | 2006-08-31 | |||
| JP2017501429A | 2017-01-12 | |||
| JP2016537670A | 2016-12-01 | |||
| JP2009070467A | 2009-04-02 | |||
| JP2005317170A | 2005-11-10 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Kenichi Shibayama
Kiharu Masaharu
Yoshiki Kuroki
Kenichi Shibayama
Kiharu Masaharu