To provide a manufacturing method for realizing a solid-state imaging device without image noise to uniformly and evenly apply a coating, when a material is applied to a microlens of the solid-state imaging device, using a spin coating method.
As the solid-state imaging device 1, in a dicing region 5X between adjoining imaging regions 9, a barrier pattern 7 having a rectangular sectional form is so formed, as a step alleviating structure, as to surround each imaging region 9. By the barrier pattern 7, a antireflection coating 8 on the microlens 6 is applied more uniformly, as compared with conventional manner, in an antireflection coating forming process by the spin coating method. As a result, the effect of applying uniform, compared with the conventional manner, is acquired at the manufacturing process, and the antireflection coating 8 on the microlens 6 presents satisfactory imaging performance.
HIGUCHI TOSHIHIRO
TAKEUCHI YASUO
KOMATSU TOMOKO
| JP2004031939A | 2004-01-29 |
Shuji Matsumura
Kobayashi Kunito
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