To provide a solvent type manicure preparation excellent in gloss of cosmetic film and endurance that can be used with very little feeling of oppression to nails and can be applied without any difference in feeling and effect on nails between immediately after production and after long storage and can be applied smoothly even after long storage because of its excellent temporal stability.

The solvent type manicure preparation includes the following components (A) to (D): (A) a siloxy-group-containing (meth)acrylic acid based copolymer of a specific structure, (B) a powder of which the surface is treated with tridecafluorooctylethoxysilane, (C) a film-forming agent other than component (A), and (D) a non-aromatic solvent.