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Title:
SOLVENT TYPE MANICURE PREPARATION
Document Type and Number:
Japanese Patent JP2009242358
Kind Code:
A
Abstract:

To provide a solvent type manicure preparation excellent in gloss of cosmetic film and endurance that can be used with very little feeling of oppression to nails and can be applied without any difference in feeling and effect on nails between immediately after production and after long storage and can be applied smoothly even after long storage because of its excellent temporal stability.

The solvent type manicure preparation includes the following components (A) to (D): (A) a siloxy-group-containing (meth)acrylic acid based copolymer of a specific structure, (B) a powder of which the surface is treated with tridecafluorooctylethoxysilane, (C) a film-forming agent other than component (A), and (D) a non-aromatic solvent.


Inventors:
Fujishiro, Hiroshi
Mizudori, Yoichi
Application Number:
JP2008000094259
Publication Date:
October 22, 2009
Filing Date:
March 31, 2008
Export Citation:
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Assignee:
KOSE CORP
International Classes:
A61K8/84; A61Q3/02
Domestic Patent References:
JP2003342128A
JP2007238690A
JP2003516948A
JPH101420A
JP2006306867A