Title:
LOW DIELECTRIC CONSTANT AMORPHOUS FLUORINATED CARBON FILM AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JP3201967
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To form amorphous fluorinated carbon film to be used as a dielectric insulation layer for an electronic device from a fluorinated ring type hydrocarbon precursor.
SOLUTION: This precursor can be selected from a group consisting of hexafluorobenzen, 1,2-diethynyltetrafuluorobenzen and 1,4-bis(trifluoromethyl) benzene. The film is adhered by adhering techniques using radiation or beam such as coating technique using ion beam, coating technique using laser, and chemical gas phase coating technique using plasma. This film is stable against heat in a non-oxidation atmosphere up to 400°C and the dielectric constant is lower than 3.0. Therefore, this film is suited to a use as an insulating body for separating a conductor in a mutual connecting construction.
Inventors:
Alfred Grill
Vishnubai Vitalbay Patel
Vishnubai Vitalbay Patel
Application Number:
JP2270197A
Publication Date:
August 27, 2001
Filing Date:
February 05, 1997
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C01B31/00; C07C22/08; C07C25/13; C23C14/06; C23C16/27; C23C16/50; H01B3/00; H01L21/312; H01L21/314; H01L21/768; H01L23/522; (IPC1-7): H01L21/314; H01L21/768
Domestic Patent References:
| JP5230659A | ||||
| JP8321217A |
Other References:
【文献】特許3184746(JP,B2)
Attorney, Agent or Firm:
Jiro Yamamoto (2 outside)