Title:
SPHERICAL SILICA FINE PARTICLE AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP3796565
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide spherical amorphous silica fine particles which are obtained by using a siloxane containing no halogen as a raw material and burning the siloxane, and which contain substantially no halogen and have 1 ppm or lower content of metal impurity other than silicon, 10 nm-10 μm particle size and 3-300 m2/g specific surface area.
SOLUTION: High purity amorphous silica fine particles containing substantially no halogen can be obtained by using the purified siloxane containing no halogen as the raw material. This manufacturing method has the advantage of obtaining the spherical silica fine particles having 10 nm-10 μm particle size and 3-300 m2/g specific surface area by making the temperature of a burning flame higher and increasing the generation number of silica nuclear particles to promote the combined growth of the silica fine particles.
Inventors:
Yoshiharu Konya
Koichiro Watanabe
Susumu Ueno
Koichiro Watanabe
Susumu Ueno
Application Number:
JP2000246132A
Publication Date:
July 12, 2006
Filing Date:
August 15, 2000
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C01B33/18; G03G9/08; (IPC1-7): C01B33/18; G03G9/08
Domestic Patent References:
| JP2188421A |
Other References:
Heiko Briesen et al.,The effect of precursor in flame synthesis of SiO2,Chem. Eng. Sci.,1998年,Vol. 53, No. 24,p.4105-4112
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
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