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Patent Searching and Data


Title:
SPIN DRIER AND WAFER PERIPHERY POLISHING DEVICE
Document Type and Number:
Japanese Patent JP2004022660
Kind Code:
A
Abstract:

To obtain a necessary blade area by preventing space formed by a wafer and a turn table from becoming a kind of closed state and to prevent the drop of a drying speed by obtaining sufficient air quantity in a spin dryer having a ventilation structure on the turn table.

The turn table 73 of the spin dryer is provided with a hub 732 having a fixing part for fixing the hub 732 to a spin shaft 72, a plurality of rod-like spokes 733 radially extended from the hub 732, annular rims 734 formed on the tops of the spokes 733, and a plurality of supporting pieces 731 attached to the rims 734 to support a disc-like work W. Fins 736 are formed on the spokes 733 to discharge air in a space surrounded by the turn table 73, the supporting pieces 731 and the wafer W downwards through apertures formed between respective spokes 733.


Inventors:
HIRATA KAZUHIKO
Application Number:
JP2002172897A
Publication Date:
January 22, 2004
Filing Date:
June 13, 2002
Export Citation:
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Assignee:
SPEEDFAM CO LTD
International Classes:
F26B5/08; F26B11/18; H01L21/304; (IPC1-7): H01L21/304; F26B5/08; F26B11/18
Attorney, Agent or Firm:
Masakage Amano
Kazuo Sadashige