To provide a spin washing device and a spin washing method, allowing little retention of foreign matter at the center of a substrate, efficiently washing the whole surface of the substrate, leaving no unwashed part to provide high quality washing.

This spin washing device 1 washing a rectangular photomask substrate 8 is provided with a rotary disc 3 rotating the photomask substrate 8; and a treatment liquid jetting means spraying the treatment liquid onto the surface of the substrate 8. The treatment liquid jetting means 5 is provided with a spot jetting hole 511 spraying the treatment liquid to the center of the photomask substrate 8 in a spot state; and multiple jetting holes 521, 531 spraying the treatment liquid in a line to the outer peripheral side from the center of the photomask substrate 8.

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