To provide a spinner device capable of evenly forming a coating film on a substrate at high accuracy.

A spinner device 1, when a prescribed coating liquid is applied on a surface of an Si substrate 20 arranged on a spinner stage 11 in which at least a contacting part with the Si substrate 20 is formed by a non-metallic material and is driven by rotation, is provided with the spinner stage 11 formed in a cup shape and a mounting part 11c at the bottom section for mounting the Si substrate 20 and an opening and closing cover 12 capable of opening and closing the upper opening part of the side part 11b which is the circumference wall of the spinner stage 11. Thus the spinner device 1 is able to prevent from generation of radially uneven thickness of the coating film accompanied by the rotation of the spinner stage 11, generation of unevenness in the coating film between the center part and the outer part by the time difference of solvent evaporation, and generation of wind crossing and able to form the even coating film by coating the coating liquid in the solvent atmosphere.