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Patent Searching and Data


Title:
SPUTTERING DEVICE IN PRODUCING PHOTOMASK
Document Type and Number:
Japanese Patent JPS5985865
Kind Code:
A
Abstract:

PURPOSE: To accomplish sputtering on many sheets of substrates simultaneously to a uniform distribution in film thickness by erecting and holding the substrates to be rotated in a vacuum vessel on and by an annular holding member in the vacuum vessel made in a cylindrical shape.

CONSTITUTION: A substrate holding member 13 formed into an annular shape is provided freely rotatably along the outside wall of a vacuum vessel 10, and substrates 17, 17... are erected between upright columnar bodies 15, 15 and are held in said member. Cr or the like is scattered from a cathode 21 and is stuck onto te substrates 17 while the member 13 is rotated by a motor 18. The peripheral speed of the substrates 17 is constant and therefore the films are formed in a uniform layer and the number of the substrates 17 is increased to about 12 sheets as compared to about 5 sheets in the prior art wherein the substrates are placed horizontally on a disc.


Inventors:
HATSUTORI ISAO
Application Number:
JP19709282A
Publication Date:
May 17, 1984
Filing Date:
November 10, 1982
Export Citation:
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Assignee:
KURIIN SAAFUEISU GIJUTSU KK
International Classes:
C23C14/50; G03F1/00; G03F1/54; (IPC1-7): C23C15/00; G03F1/02
Attorney, Agent or Firm:
Kiyoshi Nakayama