To provide a sputtering device for manufacturing a thin film solid battery and a method for manufacturing the thin film solid battery, in which, according to planar directional sizes of an active material layer and a solid electrolyte layer to be molded, the molding of the active material layer and solid electrolyte layer can be simplified.
In the sputtering device for manufacturing the thin film solid battery and the method for manufacturing the thin film solid battery, the thin film solid battery including the active material layer and solid electrolyte layer laminated by sputtering, the active material layer is molded by sputtering, and sputtering is then performed in a direction such that its minimum angle with the planar direction of the molded active material layer is smaller than the minimum angle between the planar direction of the molded active material layer and the direction of the sputtering to mold the solid electrolyte layer.
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