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Title:
SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JPS5420975
Kind Code:
A
Abstract:

PURPOSE: To prevent a substrate from being exposed to plasma and control a rise in temp. of the substrate by providing an open window opposite to the substrate for forming a thin film, a discharge electrode opposite to a target, and a shielded chamber housing the target.


Inventors:
MAKINO KOUICHI
SHINOHARA MASAKI
MATSUDA WAKATAKE
HATSUTORI SEIJI
Application Number:
JP8557177A
Publication Date:
February 16, 1979
Filing Date:
July 19, 1977
Export Citation:
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Assignee:
FUJITSU LTD
NIPPON TELEGRAPH & TELEPHONE
International Classes:
C23C14/34; G11B5/85; G11B5/851; H01F41/18; (IPC1-7): C23C15/00; H01F10/00



 
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