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Title:
SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JPS59179784
Kind Code:
A
Abstract:

PURPOSE: To provide a sputtering device provided with a target attaching mechanism without using a bonding agent and without spoiling a cooling effect by fixing a target material and a water-cooled packing plate by screwing via a thin metallic sheet.

CONSTITUTION: A rugged part facing a target 11 and a water-cooled packing plate 12 is provided in a sputtering device which deposits a metallic film or silicide film, etc. on a sample. An annular thin metallic film sheet 13 is mounted in the rugged part, and the target 11 is fixed to the plate 12 by means of a screw 14. A slight spacing 15 is provided to the rugged part, and a vent hole 16 is provided to the plate 12 to form an air vent. The workability in sputtering is improved by such target attaching mechanism and the effective utilizing rate of the target 11 is improved.


Inventors:
INOUE MINORU
Application Number:
JP5579783A
Publication Date:
October 12, 1984
Filing Date:
March 31, 1983
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
C23C14/36; C23C14/34; C23C14/35; H01L21/203; H01L21/285; H01L21/31; (IPC1-7): C23C15/00; H01L21/203; H01L21/285; H01L21/31
Domestic Patent References:
JPS57145981A1982-09-09
JPS57207175A1982-12-18
Attorney, Agent or Firm:
Sadaichi Igita



 
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