To provide a sputtering target which is used for depositing a high refractive index film based on titanium oxide, exhibits a high deposition rate and is capable of suppressing the temperature rise of the surface of a substrate when the high refractive index film is deposited on the substrate.

The sputtering target comprises titanium and zirconium substantially and has a Zr/(Zr+Ti) ratio of 5-50 atom%.