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Title:
SPUTTERING TARGET FOR FORMING FILM OF MAGNETIC RECORDING MEDIUM AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2012178210
Kind Code:
A
Abstract:

To provide a sputtering target for forming a film of a magnetic recording medium that allows deposition of a film with low ordering temperature while suppressing generation of particles, and a method for manufacturing the same.

A sputtering target for forming a film of a magnetic recording medium is composed of a sintered body having a composition expressed with a general formula: {(FexPt100-x)(100-y)Ay}(100-z)Cz, in which A represents a metal made of at least one of Au and Cu, and 30≤x≤80, 1≤y≤30 and 3≤z≤63 in atomic ratio are satisfied. Further, a method for manufacturing this sputtering target includes a step of hot-pressing, in vacuum or an inert gas atmosphere, mixed powder of: at least one of AuPt alloy powder and CuPt alloy powder; AgPt alloy powder; FePt alloy powder; Pt powder; and graphite powder or carbon black powder.


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Inventors:
ISHIYAMA KOICHI
NONAKA SOHEI
JOHO MASANORI
MATSUZAKI HIDEHARU
Application Number:
JP2012012628A
Publication Date:
September 13, 2012
Filing Date:
January 25, 2012
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
G11B5/851; B22F3/00; B22F3/14; C04B35/00; C22C1/04; C22C5/04; C22C33/02; C22C38/00; C23C14/34
Domestic Patent References:
JP2004152471A2004-05-27
JP2003313659A2003-11-06
Attorney, Agent or Firm:
Hideyuki Sugiura



 
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