Title:
磁気記録媒体用スパッタリングターゲット及び磁性薄膜
Document Type and Number:
Japanese Patent JP6881643
Kind Code:
B2
Abstract:
A sputtering target or a film that is characterized by having 0.1-10mol% of an oxide of one or more elements selected from Ca, K, Na, Pb, and Zn, 45mol% or less of Cr, and 45mol% or less of Pt, the remainder comprising Co. The present invention addresses the problem of providing a sputtering target that can greatly reduce particles originating from an oxide and can significantly improve yield during film formation. The present invention thus allows film formation for a high quality magnetic recording layer, and can improve yield for a magnetic recording medium.
Inventors:
Takashi Kojo
Application Number:
JP2020048629A
Publication Date:
June 02, 2021
Filing Date:
March 19, 2020
Export Citation:
Assignee:
JX Nippon Mining & Metals Co., Ltd.
International Classes:
C23C14/34; C23C14/14; G11B5/64; G11B5/851; H01F10/16; H01F41/18
Domestic Patent References:
| JP2005116025A | ||||
| JP2012132036A | ||||
| JP2015155573A | ||||
| JP2001250222A | ||||
| JP2002197633A |
Attorney, Agent or Firm:
Ikki Kogoshi
Isamu Ogoshi
Isamu Ogoshi