Title:
SPUTTERING TARGET, OPTICAL FUNCTION FILM AND MANUFACTURING METHOD OF SPUTTERING TARGET
Document Type and Number:
Japanese Patent JP2021075746
Kind Code:
A
Abstract:
To provide an optical function film with a durability capable of sufficiently suppressing a light reflection from a metal thin film, etc., a sputtering target capable of efficiently and stably depositing this optical function film, and a manufacturing method of this sputtering target.SOLUTION: A sputtering target contains 20 mass% or more of V and 5 mass% or more of N, and has a density ratio of 84% or more. An optical function film contains 20 atom% or more of V and N each, and provides n×k×d, a product of a film thickness d, a refractive index n, and an extinction coefficient k in a visible light region, of 30 or more and 150 or less. A manufacturing method of a sputtering target includes preparing a VN-containing raw material powder which contains 20 mass% or more of V, 5 mass% or more of N, and has 74 vol.% or more of powder with a particle size of 100 μm or less, and sintering at 1000°C or higher while the VN-containing raw material powder is pressed.SELECTED DRAWING: None
Inventors:
UMEMOTO KEITA
Application Number:
JP2019202004A
Publication Date:
May 20, 2021
Filing Date:
November 07, 2019
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
C23C14/34; C04B35/58; C23C14/06; G06F3/041
Attorney, Agent or Firm:
Yasushi Matsunuma
Mitsuo Teramoto
Fumihiro Hosokawa
Kazunori Onami
Mitsuo Teramoto
Fumihiro Hosokawa
Kazunori Onami