To provide a sputtering target containing the combination of oxides which forms a recording layer of high definition and high recording density, and a recording material of a hard disk.

The sputtering target basically comprises an alloy of cobalt-platinum (CoPt), cobalt-chrome-platinum (CoCrPt) or cobalt-chrome-platinum-boron (CoCrPtB), wherein silica oxide (SiO2) and Cr2O3 are added as an oxygen supplier during sputtering process to donate oxygen to the oxygen defects, and wherein the amount of silica oxide (SiO2) ranges from 4 to 8 atom% and the amount of chromium oxide (Cr2O3) ranges from 0.8 atom% to 5 atom%.