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Title:
モノアルキルスズアルコキシドの安定な溶液、並びにそれらの加水分解生成物及び縮合生成物
Document Type and Number:
Japanese Patent JP7295891
Kind Code:
B2
Abstract:
Precursor solutions for radiation patternable coatings are formed with an organic solvent and monoalkyl tin trialkoxides in which the water content of the solvent is adjusted to be within 10 percent of a selected value. Generally, the water content of the solvent is adjusted through water addition, although water removal can also be used. In some embodiments, the adjusted water content of the solvent can be from about 250 ppm by weight to about 10,000 ppm by weight. With the appropriate selection of ligands, the adjusted precursor solutions can be stable for at least about 42 days, and in some cases at least 8 months.

Inventors:
Kai Jiang
Steven T. Myers
Lauren Be McWade
Jeremy Anderson
Brian jay cardino
Benjamin El Clark
Dominique sumidi
Margaret Wilson-Moseys
Application Number:
JP2020570499A
Publication Date:
June 21, 2023
Filing Date:
June 19, 2019
Export Citation:
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Assignee:
Inpria Corporation
International Classes:
C09D201/00; C08G79/12; C09D5/00; C09D7/20; C09D7/63; G03F7/004; G03F7/16; G03F7/20
Domestic Patent References:
JP2019500490A
JP6805244B1
JP200484064A
JP2015149293A
JP6287260A
JP6267055A
JP2021519340A
Foreign References:
US20170102612
WO2017066319A1
WO2017163922A1
WO2012099253A1
WO1997048023A1
Attorney, Agent or Firm:
Norito Yamao
Haruhiko Ema