Title:
STAGE APPARATUS, EXPOSURE EQUIPMENT AND DEVICE FABRICATION METHOD
Document Type and Number:
Japanese Patent JP2008004918
Kind Code:
A
Abstract:
To improve a stage positioning accuracy by suppressing interference measurement length errors due to thermal changes in mounted components.
This stage apparatus comprises a stage movable portion capable of moving on a base without contact thereto, an interferometer for measuring the position of the stage movable portion, a piping or wiring connected to the stage movable portion, and a heat insulator or a heat collecting unit configured to reduce heat to be transmitted from the piping or wiring to a space where the measurement light of the interferometer passes.
Inventors:
EMOTO KEIJI
SATO HITOSHI
SASAKI YASUTO
SATO HITOSHI
SASAKI YASUTO
Application Number:
JP2007058713A
Publication Date:
January 10, 2008
Filing Date:
March 08, 2007
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/027; G01B11/00; G03F7/20; H01L21/68
Domestic Patent References:
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| JPH11122900A | 1999-04-30 | |||
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Attorney, Agent or Firm:
Keizo Nishiyama
Yuichi Uchio
Yuichi Uchio
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