Title:
ステージ装置およびそれを用いた荷電粒子線装置
Document Type and Number:
Japanese Patent JP6488073
Kind Code:
B2
Abstract:
To attain the above object, in the present invention, proposed are a stage apparatus including a sample stage that mounts a sample, a first position detection device that detects a position of the sample stage, a second position detection device that detects a position of the sample stage when the sample stage is positioned in a part of a stage movement range that the first position detection device is capable of detecting, and a control device that adjusts an offset amount of the first position detection device on the basis of a position detection result obtained by the second position detection device, and a charged particle beam apparatus using the stage apparatus.
Inventors:
Hiroki Ogawa
Maki Mizuochi
Shuichi Nakagawa
Sugawara Tsukasa
Maki Mizuochi
Shuichi Nakagawa
Sugawara Tsukasa
Application Number:
JP2014037689A
Publication Date:
March 20, 2019
Filing Date:
February 28, 2014
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/20; H01J37/22; H01J37/28
Domestic Patent References:
| JP2000187338A | ||||
| JP2004349285A | ||||
| JP11238484A | ||||
| JP2073111A | ||||
| JP2006005137A | ||||
| JP2006252800A | ||||
| JP2000180152A | ||||
| JP2004140290A |
Foreign References:
| US6486941 | ||||
| US20030234939 |
Attorney, Agent or Firm:
Yuji Toda