To provide a stage unit capable of suppressing temperature variation due to vaporization heat.
A substrate stage 2 is configured to hold and move a substrate P to be subjected to immersion exposure using a liquid LQ, and includes a second groove part 42 provided at a periphery of the held substrate P to recover the liquid LQ, a discharge hole 45 provided in a bottom part 42a of the second groove part 42 to discharge the liquid LQ recovered by the second groove part 42 to the outside of the second groove part 42, and a float valve 51 made of a material having smaller specific gravity than the liquid LQ, arranged at the second groove part 42, and floating in accordance with the level of the liquid LQ retained in the second groove part 42 to open and close the discharge hole 45.
SATO NAOTO
HARA HIDEAKI
Tadashi Takahashi
Kazuya Nishi