Title:
STEP AND REPEAT EXPOSURE METHOD
Document Type and Number:
Japanese Patent JPH0620911
Kind Code:
A
Abstract:
PURPOSE: To shorten the exchange time of a reticle, and to improve the efficiency of control by exposing a large number of different chip patterns by one reticle without being constrained by the size of the exposure field of a step and repeat exposure system.
CONSTITUTION: A large number of different chip patterns A, B, C, D are arranged at specified positions in one reticle, a reticle stage 1 and a wafer stage 4 are moved alternately by using the reticle 2, and a large number of different chip patterns (d) are exposed at a fixed position on a wafer 5 by one reticle 2.
Inventors:
TANAKA KOUKICHI
Application Number:
JP17633692A
Publication Date:
January 28, 1994
Filing Date:
July 03, 1992
Export Citation:
Assignee:
NEC CORP
International Classes:
G03F7/20; H01L21/027; H01L21/30; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)
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