Title:
STORAGE METHOD OF RESIST SUBSTRATE
Document Type and Number:
Japanese Patent JP2014013864
Kind Code:
A
Abstract:
To provide a storage method of a resist substrate capable of improving stability of resolution and uniformity for a large area when a resist constituted by containing an incomplete oxide of a transition metal is applied to thermal lithography.
The storage method of a resist substrate includes storing in an environment whose relative humidity is 30% or lower a resist substrate containing a resist layer containing an incomplete oxide of a transition metal and a substrate on a surface of which the resist layer is deposited.
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Inventors:
YAMAGUCHI FUJITO
Application Number:
JP2012151416A
Publication Date:
January 23, 2014
Filing Date:
July 05, 2012
Export Citation:
Assignee:
ASAHI KASEI E MATERIALS CORP
International Classes:
H01L21/027; G03F7/004; G03F7/26
Domestic Patent References:
| JP2009245505A | 2009-10-22 | |||
| JP2003315988A | 2003-11-06 | |||
| JP2005508509A | 2005-03-31 | |||
| JP2009217061A | 2009-09-24 | |||
| JPH1125520A | 1999-01-29 | |||
| JPH10312586A | 1998-11-24 | |||
| JP2004172272A | 2004-06-17 | |||
| JPH02141755A | 1990-05-31 | |||
| JPH0293539A | 1990-04-04 |
Foreign References:
| WO1999028213A1 | 1999-06-10 | |||
| WO2005055224A1 | 2005-06-16 |
Attorney, Agent or Firm:
Hiroyoshi Aoki
Amada Masayuki
Amada Masayuki