Title:
STRESS RECORDING MATERIAL, STRESS RECORDING STRUCTURE, STRESS RECORDER, STRESS RECORDER FORMER, STRESS RECORDING FILM FORMING PAINT, STRESS RECORDING METHOD, AND STRESS RECORDING SYSTEM
Document Type and Number:
Japanese Patent JP2023127388
Kind Code:
A
Abstract:
To provide a stress recording material that is free from influence of dark reaction caused by chemical reaction, is excellent in quantitativity and long-term record retention, and allows stress application to be known ex post facto only by observing the afterglow.SOLUTION: A material has a composition represented by general formula LixNayNbO3+(x+y-1)/2+Σ(zk*Lk/2): M1z1, M2z2, M3z3 (where M1 is any one metal ion selected from among rare earth ions and transition metal ions; M2 or M3 is none or any one metal ion selected from rare earth ions and transition metal ions; zk is a generalized representation of z1 to z3; Lk is a generalized representation of L1, L2 and L3, which are the valences of the M1, M2 and M3 ions, respectively; if M2 is none then z2 is 0; and if M3 is none then z3 is 0), provided that x=0.02 to 2, y=0.01 to 1, and z1+z2+z3=0.0001 to 0.2.SELECTED DRAWING: Figure 6
Inventors:
XU CHAO-NAN
Application Number:
JP2022031157A
Publication Date:
September 13, 2023
Filing Date:
March 01, 2022
Export Citation:
Assignee:
AIST
International Classes:
G01L1/00; C09K11/78; G01L1/24
Attorney, Agent or Firm:
Kenichiro Matsuo
Yasuo Ichikawa
Yasuo Ichikawa