Title:
強力接着性表面被覆
Document Type and Number:
Japanese Patent JP5008978
Kind Code:
B2
Abstract:
In a process for the production of a strongly adherent coating on an inorganic or organic substrate, wherein a), a low-temperature plasma treatment, a corona discharge treatment or a flame treatment is carried out on the inorganic or organic substrate, b) one or more photoinitiators or mixtures of photoinitiators with monomers or/and oligomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied to the inorganic or organic substrate, and optionally, c) using suitable methods those afore-mentioned substances are dried and/or are irradiated with electromagnetic waves, it proves advantageous to use compounds of formula (I), (II), (III) and/or (IV), IN-L-RG (I), >IN-L-RG1-L1-H (II), IN-L-RG1-L1-IN1 (III), IN-L-RG1-L1-RG2-L2-IN1 (IV), wherein IN and IN1 are each independently of the others a monacylphosphine, monoacylphosphine oxide or monoacylphosphine sulfide photoinitiator group; L1 L1 and L2 are a single bond or a spacer group; RG is a monovalent radical having at least one ethylenically unsaturated C-C bond; and RG1 and RG2 are each independently of the other a divalent radical having at least one ethylenically unsaturated C-C bond.
Inventors:
Wolf, Jean-Pierre
Kuntz, Martin
Kuntz, Martin
Application Number:
JP2006530197A
Publication Date:
August 22, 2012
Filing Date:
May 14, 2004
Export Citation:
Assignee:
Ciba Holding Inc.
International Classes:
B05D7/24; B05D3/06; B05D3/08; C07F9/50; C08F2/50; C08F283/00; C08F290/06; C08F290/14; C09D5/00; C09D7/12; C09D201/02; C09J7/02; C09J201/02; B05D3/14
Domestic Patent References:
| JP2002069085A | ||||
| JP2002528568A | ||||
| JP10095788A | ||||
| JP2003522021A |
Attorney, Agent or Firm:
Hajime Tsukuni
Fumio Shinoda
Koshiro Tsukuda
Fumio Shinoda
Koshiro Tsukuda