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Title:
STRUCTURE
Document Type and Number:
Japanese Patent JP2012017578
Kind Code:
A
Abstract:

To provide a novel structure capable of efficiently exhibiting fungus resistance and mildew resistance with an excellent design.

A structure comprises: a fungusproof and mildewproof layer on a substrate; and a pattern layer on the fungusproof and mildewproof layer. The fungusproof and mildewproof layer contains a fungusproofing and mildewproofing agent. Essential components of the pattern layer comprise: a synthetic resin (A) constituting a coat having a reflection region with a reflectance of 10% or more in a wavelength range from 300 to 500 nm; a colored aggregate (B) having an average particle diameter from 0.01 to 5 mm; a moisture conditioning powder (C); and a photocatalytic metal oxide (D) exhibiting a photocatalytic action in the reflection region.


Inventors:
KOBAYASHI TAKESHI
KAKEIDA AKITSUGU
KURODA YOJI
Application Number:
JP2010154377A
Publication Date:
January 26, 2012
Filing Date:
July 06, 2010
Export Citation:
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Assignee:
BEKKU KK
International Classes:
E04F13/08
Domestic Patent References:
JP2006341411A2006-12-21
JPH07113272A1995-05-02
JP2007085118A2007-04-05



 
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